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HS Code 39201023 - polyethylene film for photoresist
Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Examples (No official information or warranty)
- Non-cellular polyethylene film, 20 micrometres thick, for photoresist film in semiconductor production
- Polyethylene film, 30 micrometres thickness, used in photoresist film for printed circuit manufacturing
- Non-cellular polyethylene film, 35 micrometres thick, for photoresist film in semiconductor fabrication
- Polyethylene film, 25 micrometres thickness, for photoresist film used in printed circuit production
- Non-cellular polyethylene film, 40 micrometres thick, for photoresist film in semiconductor manufacturing
- Polyethylene film, 22 micrometres thickness, used in photoresist film for printed circuit fabrication
- Non-cellular polyethylene film, 38 micrometres thick, for photoresist film in semiconductor production
- Polyethylene film, 30 micrometres thickness, used in photoresist film for printed circuit manufacturing
- Non-cellular polyethylene film, 35 micrometres thick, for photoresist film in semiconductor fabrication
- Polyethylene film, 25 micrometres thickness, for photoresist film used in printed circuit production
- Non-cellular polyethylene film, 40 micrometres thick, for photoresist film in semiconductor manufacturing
- Polyethylene film, 22 micrometres thickness, used in photoresist film for printed circuit fabrication
- Non-cellular polyethylene film, 38 micrometres thick, for photoresist film in semiconductor production
Code Tree Structure / Hierarchy
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3920
Other plates, sheets, film, foil and strip, of plastics, non-cellular and not reinforced, laminated, supported or similarly combined with other materials
392010
Of polymers of ethylene
Of a thickness not exceeding 0,125 mm
Of polyethylene having a specific gravity of
Less than 0,94
39201023
Polyethylene film, of a thickness of 20 micrometres or more but not exceeding 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
39201024
Stretch film, not printed
39201025
Other
Trade restrictions and policies
Chapter 39
44 Trade restrictions and policies
Position 3920
11 Trade restrictions and policies
Subheading 392010
1 Trade restrictions and policies
Customs Tariff Number 39201023
2007-01-01
ERGA OMNES (1011)
Non preferential duty under end-use
Regulation 1549/06
2009-01-01
Bosnia and Herzegovina (BA)
Tariff preference
Decision 0474/08
2009-01-01
North Macedonia (MK)
Tariff preference
Decision 0239/04
2009-04-01
Albania (AL)
Tariff preference
Decision 0332/09
2010-02-01
Serbia (XS)
Tariff preference
Decision 0036/10
2010-05-01
Montenegro (ME)
Tariff preference
Decision 0224/10
2016-04-01
Kosovo (XK)
Tariff preference
Decision 0342/16
2016-07-01
ERGA OMNES (1011)
Suspension - goods for certain categories of ships, boats and other vessels and for drilling or production platforms
Regulation 2658/87
2017-09-21
Canada (CA)
Tariff preference
Decision 0037/17
2017-09-21
EU-Canada agreement: re-imported goods (1006)
Tariff preference
Decision 0037/17
2020-02-01
Japan (JP)
Tariff preference
Decision 1907/18
2023-06-24
Russian Federation (RU)
Export control
Regulation 0833/14
2025-02-25
Belarus (BY)
Export control
Regulation 0765/06
Changes to this tariff number
Changes in favor of 39201023
1996:
39201022
➜
1997:
39201023